Detailed Product Description PECVD  Series can be used for matel, dielectric and semiconductor coatings, such as SiO2, Si3N4, amorphous Si, polyeristalline Si, SiC, W, Ti-Si, GaAs, GaSb and so on. PECVD technology can greatly reduce the reaction temperature which is critical for some...

Detailed Product Description These seris include ZHD-230A, ZHD-230B and ZHD-230C. Main technical specifications are as follows:Vacuum pumps: Diffusion+Vane pump  or  Molecular pum+Vane pumpUltimate vacuum: 6.6 ×10-4 Pa(with Diffusion pump) or...

Detailed Product Description They are very suitable for bright annealing of silicon-steel plates, soft-magnetic materials, electrician malleable cast-iro, copper alloy; for bright annealing of high-speed steel, die steel, tool steel, alloy steel, titanium alloy; removing the residual stress of...

Detailed Product Description PECVD-450 Vacuum Equipment is plasma chemical vapor deposition equipment, mainly used in SiO2, Si3N4, amorphous Si : H, polycrystalline Si, SiC, W, Ti-Si, GaAs, GaSb dielectric such as semiconductor and metal film. Plasma-enhanced chemical vapor deposition can be much...

Detailed Product Description They are very suitable for bright annealing of silicon-steel plates, soft-magnetic materials, electrician malleable cast-iro, copper alloy; for bright annealing of high-speed steel, die steel, tool steel, alloy steel, titanium alloy; removing the residual stress of...

Detailed Product Description PECVD  Series can be used for matel, dielectric and semiconductor coatings, such as SiO2, Si3N4, amorphous Si, polyeristalline Si, SiC, W, Ti-Si, GaAs, GaSb and so on. PECVD technology can greatly reduce the reaction temperature which is critical for some...

Detailed Product Description TypePECVD-200 PECVD-450 PECVD-650 Dimension of the deposition chamberΦ230×H300 mmΦ450×H400 mmΦ650×H600 mmDimension of the substrate platformΦ100×10 mmΦ120×12 mmΦ150×15 mmRotation rate of the substrate...

Detailed Product Description vacuum machine-----TLJ-140 Ion Sputtering Machine is sputtering and etching function. Used scanning electron microscope samples coated conductive film (membrane), the device is easy and simple. Ion sputtering Machine with scanning electron microscopy sample preparation...

Detailed Product Description JCP-350 Magnetron Sputtering Machine is configured with RF, DC and A2 K Power, and can be used  to plate monolayer and  multilayer films of matel, dielectric, semic onductor, alloy and so on.TypeJCP350AJCP350BJCP350CCoating...

Detailed Product Description JCP450 Magnetron sputtering series equipment,The main series of DC / non-symmetric bipolar pulse / RF magnetron sputtering, vapor deposition and other functions, a multi-purpose can be realized. Mainly used in metal film, the semiconductor film, compound film, film,...