- Contact Person : Mr. Peng Robert
- Company Name : Beijing Technol Science Co., Ltd.
- Tel : 86-10-62714351
- Fax : 86-10-62711482
- Address : Beijing,beijing,Room1108 jingyanlong mansion jingbangyuan district xisanqi bridge north haidian beijing china
- Country/Region : China
- Zip : 100096
Plasma Enhanced Chemical Vapor Deposition 800 equipment
Detailed Product Description
Type | PECVD-200 | PECVD-450 | PECVD-650 |
Dimension of the deposition chamber | Φ230×H300 mm | Φ450×H400 mm | Φ650×H600 mm |
Dimension of the substrate platform | Φ100×10 mm | Φ120×12 mm | Φ150×15 mm |
Rotation rate of the substrate platform | 0-20 rpm ( adjustable ) | ||
Power supply | RF power supply | ||
Vacuum pumps | Molecular pump + Mechanical pump | ||
Highest attained vacuum | 6. 6 ×10-5 Pa | ||
Film types | Dielectric / Semiconductor / Metal film | ||
Gas flow control | 3-4 Road gas flow control (optional) | ||
Vacuum chamber | Pre-open vertical structures, Under-position pumping systems | ||
Pumping speed | Pumping time≤30 min, from atmospheric pressure to 10-3Pa | ||
Film uniformity | The fluctuations of the film thickness are less than 5% | ||
Vacuum measurement | Digital composite vacuum gauges, Vacuum measurement ranging from atmospheric pressure to 10-6 Pa | ||
Vacuum control | Available Manual / PLC / PLC+HMI Control (optional) | ||
Protection | Alarm and automatic protection function for waterdepletion, abnormal flow, over current flowing, over voltage, andelectrical shutdown, etc. | ||
Basic parameters | Power≥10 KW; Served area: 4-20 m2; Weight 100-800 kg | ||
Optional devices | Water cooling & recycling machine, Residual gas analyzer | ||
