- Contact Person : Mr. Peng Robert
- Company Name : Beijing Technol Science Co., Ltd.
- Tel : 86-10-62714351
- Fax : 86-10-62711482
- Address : Beijing,beijing,Room1108 jingyanlong mansion jingbangyuan district xisanqi bridge north haidian beijing china
- Country/Region : China
- Zip : 100096
HF-450 Hot-filament Chemical Vapor Deposition System
Detailed Product Description
| functions | HF-450 Hot-filament Chemical Vapor Deposition System operate on the basis of hot-filament chemical vapor deposition technique, and can be used to deposit thick diamond films, silicon nitride films, and silicon dioxide films, etc. They are extremely suitable for industrial production and have been implemented on the product lines of a lot of well-known companies. Using our equipments, these companies have already produced sheet-like polycrystalline diamond wafers with large dimensions and realized considerable economic benefits from these products. In addition, our equipments are also very suitable for scientific research and education and for the large-scale development of new commercial products. | |
Type | Type A | Type B | Type C |
Dimension of the sputtering chamber | Φ450×H450mm | Φ650×H770mm | Φ800×H800mm |
Dimension of the Substrate platform | Φ150×H44mm | Φ200×H44mm | Φ300×H44mm |
Height of the Substrate platform | 200?150mm | 200?150mm | 200?150mm |
Rotation rate of the Substrate platform | 0-20 rpm (adjustable) | 0-20 rpm (adjustable) | 0-20 rpm (adjustable) |
Electrode size | Φ24×200mm | Φ24×200mm | Φ24×200mm |
Current across the electrode | > 300 A | > 300 A | > 300 A |
Oxidation resistance of the materials | Atmospheric oxidation resistance | Atmospheric oxidation resistance | Atmospheric oxidation resistance |
Film types | Thick diamond films | Thick diamond films | Thick diamond films |
Power supply | Hot-wire power supply | Hot-wire power supply | Hot-wire power supply |
Structure of the vacuum chamber | Pre-open vertical structures, Postposition pumping systems, Double-layer water cooling | ||
Highest attained vacuum | 1.0×10-3 Pa | ||
Vacuum pumps | Diffusion pump + Roots pumps + mechanical pump + process pump | ||
Pumping speed | Pumping time≤30 min, from atmospheric pressure to 10-3Pa | ||
Film uniformity | The fluctuations of the film thickness are less than 5% | ||
Vacuum measurement | Two low, one high digital composite vacuum gauges, Film thickness gauges | ||
Vacuum control | Manual control or automatic control | ||
Gas flow control | Three Road gas flow control and the corresponding display systems | ||
Protection | Alarm and automatic protection function for water depletion, abnormal flow, over current flowing, over voltage, and electrical shutdown, etc. | ||
Basic parameters | Power≥15KW; Weight: 500kg; Served area: 8m2 | ||
Optional devices | Deionized water cooling & recycling machine, PLC control, the entire manual control, semi-automatic control | ||
