- Contact Person : Mr. Peng Robert
- Company Name : Beijing Technol Science Co., Ltd.
- Tel : 86-10-62714351
- Fax : 86-10-62711482
- Address : Beijing,beijing,Room1108 jingyanlong mansion jingbangyuan district xisanqi bridge north haidian beijing china
- Country/Region : China
- Zip : 100096
PECVD-450 Vacuum Machine
Detailed Product Description
PECVD-450 Vacuum Equipment is plasma chemical vapor deposition equipment, mainly used in SiO2, Si3N4, amorphous Si : H, polycrystalline Si, SiC, W, Ti-Si, GaAs, GaSb dielectric such as semiconductor and metal film. Plasma-enhanced chemical vapor deposition can be much lower than the temperature of deposition reaction. CVD thermal stability so that the poor may become deposited on the substrate surface. For example, in the low or low melting point of Al softening point on the surface of the polymer substrate for CVD coating. In the high-temperature phase change can occur under the surface of the metal or alloy coating CVD. The lower temperature can effectively inhibit the production of semiconductor devices spread between the layers. The lower deposition temperature, but also can reduce thermal stress mismatch.
Type | PECVD-200 | PECVD-450 | PECVD-650 |
Dimension of the deposition chamber | Φ230×H300 mm | Φ450×H400 mm | Φ650×H600 mm |
Dimension of the substrate platform | Φ100×10 mm | Φ120×12 mm | Φ150×15 mm |
Rotation rate of the substrate platform | 0-20 rpm ( adjustable ) | ||
Power supply | RF power supply | ||
Vacuum pumps | Molecular pump + Mechanical pump | ||
Highest attained vacuum | 6. 6 ×10-5 Pa | ||
Film types | Dielectric / Semiconductor / Metal film | ||
Gas flow control | 3-4 Road gas flow control (optional) | ||
Vacuum chamber | Pre-open vertical structures, Under-position pumping systems | ||
Pumping speed | Pumping time≤30 min, from atmospheric pressure to 10-3Pa | ||
Film uniformity | The fluctuations of the film thickness are less than 5% | ||
Vacuum measurement | Digital composite vacuum gauges, Vacuum measurement ranging from atmospheric pressure to 10-6 Pa | ||
Vacuum control | Available Manual / PLC / PLC+HMI Control (optional) | ||
Protection | Alarm and automatic protection function for water depletion, abnormal flow, over current flowing, over voltage, and electrical shutdown, etc. | ||
Basic parameters | Power≥10 KW; Served area: 4-20 m2; Weight 100-800 kg | ||
Optional devices | Water cooling & recycling machine, Residual gas analyzer | ||
