- Contact Person : Mr. Peng Robert
- Company Name : Beijing Technol Science Co., Ltd.
- Tel : 86-10-62714351
- Fax : 86-10-62711482
- Address : Beijing,beijing,Room1108 jingyanlong mansion jingbangyuan district xisanqi bridge north haidian beijing china
- Country/Region : China
- Zip : 100096
JCP-350 Magnetron Sputtering Machine
Detailed Product Description
JCP-350 Magnetron Sputtering Machine is configured with RF, DC and A2 K Power, and can be used to plate monolayer and multilayer films of matel, dielectric, semic onductor, alloy and so on.
Type | JCP350A | JCP350B | JCP350C |
Coating methods | Two-target asymmetric bipolar pulse magnetron sputtering coating | Three-target magnetron co-sputtering coating | RF/DC magnetron sputtering coating + Evaporation coating |
Film types | Metal films, Conducting films, Reaction films, Semiconductor films, Corrosion resisting films | Multi-layer films, Reaction films, Compound films, Hard films, Semiconductor films, Sensor films, Heat-resisting alloy films | Metal films, Dielectric films, Reaction films, Organic films, Corrosion resisting films, Heat-resisting alloy films |
Power supply | 500-W bipolar pulse power supply×2 | 500-W bipolar pulse power supply×3 | 500-W DC power supply ×1; |
Structure of the sputtering target | Φ50.8 mm permanent magnetic target ×2 (reserve interface for evaporation coating) | Φ50.8 mm permanent magnetic target ×3 (reserve interface for evaporation coating) | Φ50.8 mm permanent magnetic target ×3, A pair of evaporation electrodes |
Vacuum chamber | Pre-open vertical structures, Postposition pumping systems | ||
Highest attained vacuum and leakage rate | 6.6×10-5Pa; Leakage rate: from vacuum chamber pressure to lower than 10 Pa after turn of the power for about 12 h | ||
Vacuum pumps | Molecular pump + Mechanical pump | ||
Pumping speed | Pumping time≤20 min, from atmospheric pressure to 10-3Pa | ||
Film uniformity | The fluctuations of the film thickness are less than 5% | ||
Baking temperature of the workpiece | Adjustable and controllable from room temperature to 500 °C (PID Temperature Control) | ||
Operation mode of the workpiece | Revolution, 0?20 rpm stepless speed change (adjustable and controllable) | ||
Vacuum measurement | Digital composite vacuum gauge | ||
Vacuum control | Available Manual /PLC/PLC+HMI Control (optional) | ||
Gas flow control | 1-3 Road gas flow control and the display system | ||
Protection | Alarm and automatic protection function for water depletion, abnormal flow, over current flowing, over voltage, and electrical shutdown, etc. | ||
Basic parameters | Power≥9KW; Served area: 10m2 | ||
Optional devices | Minus bias 0-300V/-1000V, Electromagnetic target and the power supply, Water cooling & recycling machine, Electromagnetic targets, Anti-sputtering cleaning, Film thickness monitoring | ||
