Hot-filament Chemical Vapor Deposition System

Detailed Product Description

Basic principles and functions: This series of systems operate on the basis of hot-filament chemical vapor deposition techniquem abd cab be used to deposit thick ;diamond films, and silicon dioxide films, etc. They are extremely suitable for industrial production and have been implemented on the product lines of a lot of well-known companies. Using our equipments, these companies have already produced sheet-like polycrystanlline diamond wafers with large dimensions and realized considerable economic benefits from these products, In addition, our equipments are  also very suitable for scientific reaearch and education and for the large-scale development of new commercial products.