Detailed Product Description Vacuum Machine-----ZHD-300 main vapor deposition function, single-preparation laboratory and industrial production quality oxide dielectric quality. semiconductor compounds, the most common method of high-temperature superconducting films. ...

Detailed Product Description Vacuum Machine----ZHD-450 Resistance Evaporation Coating Machines main vapor deposition function, single-preparation laboratory and industrial production quality oxide dielectric quality. semiconductor compounds, the most common method of high-temperature...

Detailed Product Description TypePECVD-200 PECVD-450 PECVD-650 Dimension of the deposition chamberΦ230×H300 mmΦ450×H400 mmΦ650×H600 mmDimension of the substrate platformΦ100×10 mmΦ120×12 mmΦ150×15 mmRotation rate of the substrate...

Detailed Product Description Basic principles and functions: This series of systems operate on the basis of hot-filament chemical vapor deposition techniquem abd cab be used to deposit thick ;diamond films, and silicon dioxide films, etc. They are extremely suitable for industrial production and...

Detailed Product Description Basic principles and functions: This series of systems operate on the basis of hot-filament chemical vapor deposition techniquem abd cab be used to deposit thick ;diamond films, and silicon dioxide films, etc. They are extremely suitable for industrial production and...

Detailed Product Description functionsThis series of equipments mainly carry out thermal treatment of materials in high vacuum environment. They are very suitable for bright annealing of silicon-steel plates, soft-magnetic materials, electrician malleable cast-iron, copper alloy; for bright...

Detailed Product Description It  is configured with RF, DC and A2 K Power, and can be used  to plate monolayer and  multilayer films of matel, dielectric, semiconductor, alloy and so on. ...

Detailed Product Description hese series place magnetron  sputtering, multi-arc ion plating and evaporationplating in one chamber. It is convenient to choose your favourites. They can be used separately or synchronously, then it is convenient to plate monolayer or multi-layer films, such...

Detailed Product Description In order to preventing the discharge of magnetron sputtering target surface we design the Dual Pulse Power. The positve voltage and negative voltage is unsymmetrical.  Especially it is extremely effective when you deposit dielectric films and...

Detailed Product Description These seris include ZHD-230A, ZHD-230B and ZHD-230C. Main technical specifications are as follows:Vacuum pumps: Diffusion+Vane pump  or  Molecular pum+Vane pumpUltimate vacuum: 6.6 ×10-4 Pa(with Diffusion pump) or...