Detailed Product Description TypePECVD-200 PECVD-450 PECVD-650 Dimension of the deposition chamberΦ230×H300 mmΦ450×H400 mmΦ650×H600 mmDimension of the substrate platformΦ100×10 mmΦ120×12 mmΦ150×15 mmRotation rate of the substrate...

Detailed Product Description Basic principles and functions: This series of systems operate on the basis of hot-filament chemical vapor deposition techniquem abd cab be used to deposit thick ;diamond films, and silicon dioxide films, etc. They are extremely suitable for industrial production and...

Detailed Product Description Basic principles and functions: This series of systems operate on the basis of hot-filament chemical vapor deposition techniquem abd cab be used to deposit thick ;diamond films, and silicon dioxide films, etc. They are extremely suitable for industrial production and...

Detailed Product Description hese series place magnetron  sputtering, multi-arc ion plating and evaporationplating in one chamber. It is convenient to choose your favourites. They can be used separately or synchronously, then it is convenient to plate monolayer or multi-layer films, such...

Detailed Product Description It  is configured with RF, DC and A2 K Power, and can be used  to plate monolayer and  multilayer films of matel, dielectric, semiconductor, alloy and so on. ...

Detailed Product Description These seris include ZHD-230A, ZHD-230B and ZHD-230C. Main technical specifications are as follows:Vacuum pumps: Diffusion+Vane pump  or  Molecular pum+Vane pumpUltimate vacuum: 6.6 ×10-4 Pa(with Diffusion pump) or...

Detailed Product Description PECVD  Series can be used for matel, dielectric and semiconductor coatings, such as SiO2, Si3N4, amorphous Si, polyeristalline Si, SiC, W, Ti-Si, GaAs, GaSb and so on. PECVD technology can greatly reduce the reaction temperature which is critical for some...

Detailed Product Description PECVD  Series can be used for matel, dielectric and semiconductor coatings, such as SiO2, Si3N4, amorphous Si, polyeristalline Si, SiC, W, Ti-Si, GaAs, GaSb and so on. PECVD technology can greatly reduce the reaction temperature which is critical for some...

Detailed Product Description JCP-350 Magnetron Sputtering Machine is configured with RF, DC and A2 K Power, and can be used  to plate monolayer and  multilayer films of matel, dielectric, semic onductor, alloy and so on.TypeJCP350AJCP350BJCP350CCoating...

Detailed Product Description Vacuum Coating Machine-----JCP-350 Magnetron Sputtering Machine is configured with RF, DC and A2 K Power, and can be used  to plate monolayer and  multilayer films of matel, dielectric, semic onductor, alloy and so...